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OPTORUN CO.,LTD.(6235) Summary

6235
TSE Prime
OPTORUN CO.,LTD.
1,302
JPY
-19
(-1.44%)
Apr 16, 3:30 pm JST
9.14
USD
Apr 16, 2:30 am EDT
Result
PTS
outside of trading hours
1,296.9
Apr 16, 3:08 pm JST
Summary Chart Historical News Financial Result
PER
8.0
PBR
0.87
Yield
4.15%
Margin Trading Ratio
5.23
Stock Price
Apr 16, 2025
Opening Apr 16, 9:00 am
1,320 JPY 9.22 USD
Previous Close Apr 15
1,321 JPY 9.23 USD
High Apr 16, 9:02 am
1,333 JPY 9.31 USD
Low Apr 16, 3:01 pm
1,291 JPY 9.07 USD
Volume
110,000
Trading Value
0.14B JPY 1.01M USD
VWAP
1310.51 JPY 9.21 USD
Minimum Trading Value
130,200 JPY 914 USD
Market Cap
0.06T JPY 0.41B USD
Number of Trades
485
Liquidity & Number of Trades
As of Apr 16, 2025
Liquidity
Slightly High
1-Year Average
894
1-Year High May 14, 2024
7,868
Margin Trading
Date Short Interest Long Margin Positions Ratio
Apr 11, 2025 26,100 466,100 17.86
Apr 4, 2025 25,300 461,600 18.25
Mar 28, 2025 25,900 471,100 18.19
Mar 21, 2025 19,200 472,900 24.63
Mar 14, 2025 19,900 444,000 22.31
Company Profile
OPTORUN CO.,LTD. manufactures and sells optical thin film deposition equipment. The company focuses on automotive cameras and smartphones, with a strong advantage in comprehensive services including maintenance.
Sector
Machinery
OPTORUN CO.,LTD.'s main business is the manufacture and sale of optical thin film deposition equipment. The company provides optical thin film deposition systems used in touchscreens, casings, biometric sensors, camera modules, LED light sources, automotive cameras, and surveillance cameras for smartphones, tablets, and other devices. With a significant portion of production and sales in China, OPTORUN's customers include optical thin film deposition manufacturers and end-product manufacturers using optical thin films. Beyond equipment sales, OPTORUN distinguishes itself by offering deposition process advice and thin film deposition solutions that leverage its technical expertise, catering to diverse customer needs. The company handles various deposition methods, including ion beam-assisted deposition, reactive plasma deposition, sputtering, and atomic layer deposition.